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A New Alternative to Self-Aligned Double Patterning: Pitch Splitting by Atomic Layer Etching

Year: 2025

Type: conference-abstract

Source: ECS Meeting Abstracts

DOI: 10.1149/ma2025-02311614mtgabs

Authors: Jonas Sundqvist, Muhammad H. Asif, Intu Sharma, Yoana Ilarionova, Robin Athle, Amin Karimi, Reza Jafari Jam, Fred Roozeboom, Dmitry B. Suyatin

Institution: University of Twente

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4416600172

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