Outside Front Cover: Solution ALD of (CH 3 NH 3 )(PbI 3 ) Perovskite Thin Films Yields Functional Quality and Stability Superior to Classical Processing (Angew. Chem. Int. Ed. 3/2026)
Year: 2025
Type: article
Abstract: Atomic layer deposition builds up solids in individual atomic steps by a cyclic repetition of successive surface reactions. In the Communication (e13903) by Julien Bachmann and co-workers this approach is adapted to form high-quality halide perovskite thin films from dissolved precursors. Pivalate ligands solubilize lead ions and deliver them to the surface, enabling rapid, controlled film growth. In situ investigations capture the moment of nucleation in the process of forming the semiconductor.
Authors: Vanessa M. Koch, Xinyi Zeng, Andreas S. Deckert, Pascal Büttner, Evanie Franz, Fei Ding, Michael A. Anderson, Jiyun Zhang, Christian Kupfer, Elena A. Mack, Vipul K. Ambasta, Patrick Duchstein, Katharina E. Dehm, Stevie Furxhiu, Achim Zahl, Johannes Frisch, Felix Hoga, Tobias Stubhan, Regan G. Wilks, Zijian Peng, Olaf Brummel, Ryan W. Crisp, Dirk Zahn, Carolin Müller, Dirk M. Guldi, Marcus Bär, Dorothea Wisser, Jörg Libuda, Christoph J. Brabec, Julien Bachmann
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: bronze
OpenAlex ID: W4416608164
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