Work

Analysis for roughness-generation mechanism in Ru etching using Cl2/O2-based plasma for advanced interconnect

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0004927

Authors: Miyako Matsui, Tomoyasu Shohjoh, Makoto Miura, Kenichi Kuwahara

Institutions: Hitachi (Japan), Hitachi High-Tech (Japan)

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Hitachi

OpenAlex ID: W4416633609

FWCI:

Cites: 25

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