Work

In Situ Synthesis of Perovskite Quantum Dot Photoresist in Polymerizable Solvent for 3D Printing and Anti‐Counterfeiting

Year: 2025

Type: article

Source: Journal of Applied Polymer Science

DOI: 10.1002/app.70085

Authors: Yong‐Jie Zhang, Yiling Lian, Huan Gao, Ji Huang, Jing Li, Feng Jin

Institutions: Beijing Institute of Petrochemical Technology, University of Hong Kong, National Institute of Metrology, Chinese Academy of Sciences, Technical Institute of Physics and Chemistry

Language: English

Topic: Perovskite Materials and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Awards: 多重响应型可调谐光子晶体微型激光器的双光子加工与性能研究, G6770144020

OpenAlex ID: W4416678269

FWCI: 0.227

Cites: 45

Cited by: 1

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