Dual-step pulsed electrodeposition enables microstructural control and redox kinetics in iron oxide films
Year: 2025
Type: article
Abstract: This work investigates the effect of deposition parameters on the structural and electrochemical performance of iron oxide thin films fabricated via direct reverse-pulsed hydrothermal electrodeposition (RP-HED) and dual-step reverse-pulsed hydrothermal electrodeposition (DRP-HED). By systematically varying the duty cycle (0.1, 0.25, and 0.5) and pulse frequency (10, 100, and 500 Hz), we correlated the changes in film morphology, crystallinity, surface wettability, and capacitive behavior. XRD analysis revealed that the DRP-HED samples possessed smaller crystallite sizes (22–35 nm) and more stable lattice constants ( a = 8.371–8.394 Å) compared to RP-HED counterparts. Contact angle measurements showed improved surface energy, with the lowest contact angle of 62.16° observed for the DRP-HED sample at a 0.5 duty cycle and 10 Hz. Electrochemical characterization demonstrated that the DRP-HED sample prepared at a duty cycle of 0.25 and 10 Hz achieved the highest specific areal capacitance of 22.22 mF cm − 2 at 2.5 mA cm − 2 , along with a smaller IR drop and extended discharge time. The DRT analysis confirmed a dominant mid-frequency relaxation peak, indicating efficient redox kinetics and reduced polarization. The results affirm that DRP-HED, particularly under optimized pulsing parameters, provides a tunable and scalable route for engineering high-performance iron oxide electrodes for supercapacitor applications.
Source: Scientific Reports
Authors: Po-Wei Chi, Jinx Xian Lin, Phillip M. Wu, Hwai-En Lin
Language: English
Field: Materials Science
Domain: Physical Sciences
Open Access status: gold
Estimated APC paid: $2,690
Awards: G1662538391, G5388542475, Preparation of Nickel-Based Alloy Thin Films Using Recovery Waste Solution Extracting from Lithium-Ion Battery Electrode Scrap, Investigate the Effects of Using Electrochemical Processes to Intercalate Alkaline-Metal to Transition Chalcogenides and Related Superconductors( I ), G7322518905, G8759721202, G905465996
OpenAlex ID: W4416759629