Work

Sulfur-rich polymer with nanoparticles: high refractive index dual-tone photoresist

Year: 2025

Type: article

Abstract: Synthesis and lithographic application of high refractive index sulfur-containing polymer.

Source: Materials Advances

DOI: 10.1039/d5ma01190f

Authors: Xiaofei Qian, Tao Liu

Institution: Fudan University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $1,962

Funder: Natural Science Foundation of Shanghai

Award: 5nm以下半导体芯片制造用DSA光刻材料

OpenAlex ID: W4416792302

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Cites: 48

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