Robust multilevel storage characteristics of Al 2 O 3 /HfO 2 /Al 2 O 3 trilayer-structured memristor fabricated by atomic layer deposition for neuromorphic computing
Year: 2025
Type: article
Source: Nanotechnology
Authors: Jian Liu, Xiaolong Zhou, Junjun Ouyang, Kunji Chen, Ke Wang
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Award: G5707839955
OpenAlex ID: W4416888624
