Sequential Phosphorus Doping and Selective Etching: A Dual‐Step Approach for CO 2 Reduction Pathway Regulation in Rhodium Catalysts
Year: 2025
Type: article
Source: Angewandte Chemie
Authors: Xiaoxu Wei, Zijian Wang, Qing Xie, Xiaowei Mu, Han Chu, Yuxiong Li, Haoyang Liu, Huilin Wang, Wei Liu, Shuyan Song, Hongjie Zhang, Xiao Wang
Language: English
Subfield: Catalysis
Field: Chemical Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4416896811
