Computational Study of Gas‐Phase and Surface Kinetics in a Clamshell Type Microwave Plasma Chemical Vapor Deposition Reactor for Diamond Growth
Year: 2025
Type: article
Source: physica status solidi (b)
Institution: Indian Institute of Technology Madras
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4416914744
