Work

Influence of atomic layer deposition on nickel hydroxide phase transitions in nickel foam

Year: 2025

Type: article

Abstract: This study investigates how Al 2 O 3 and V 2 O 5 coatings deposited on nickel foam by atomic layer deposition (ALD) modifies its electrochemical phase evolution in alkaline media. Phase transitions and surface kinetics were characterized using cyclic voltammetry (CV), in situ X-ray diffraction (XRD), electrochemical impedance spectroscopy (EIS), and Tafel analysis. Bare NF exhibits a positive cathodic peak shift for α-Ni(OH) 2 formation over 100 CV cycles attributed to surface activation. NF coated with Al 2 O 3 (NF-A) showed a larger shift (+90 mV) indicating enhanced charge transfer kinetics and reduced energy barrier. In contrast, V 2 O 5 -coated NF (NF-V) showed no shift suggesting a suppressed surface kinetics. These shifts disappear at higher scan rates suggesting a kinetic effect rather than a diffusion-induced behavior. Tafel and EIS measurements show that NF-A has the lowest charge transfer resistance, while NF-V exhibits the largest resistance. In situ XRD provides direct evidence for α-Ni(OH) 2 formation during extended cycling under alkaline conditions. These results demonstrate that different ALD coatings can selectively modulate surface kinetics and phase accessibility of nickel foam which can contribute to the design of nickel-based electrodes for phase-specific electrochemical applications.

Source: Electrochemistry Communications

DOI: 10.1016/j.elecom.2025.108091

Authors: Samutr Assavachin, Surat Prempluem, Somlak Ittisanronnachai, Sukritta Janprakhon, Montree Sawangphruk

Institution: Vidyasirimedhi Institute of Science and Technology

Language: English

Topic: Electrocatalysts for Energy Conversion

Subfield: Renewable Energy, Sustainability and the Environment

Field: Energy

Domain: Physical Sciences

SDG: Affordable and clean energy

Open Access status: gold

Estimated APC paid: $2,630