Work

Thin Film and Bulk Morphologies in Linear Triblock Terpolymers of Polystyrene, Polybutadiene and Poly(dimethylsiloxane)

Year: 2025

Type: article

Source: ACS Applied Polymer Materials

DOI: 10.1021/acsapm.5c03342

Authors: Mingchao Ma, Konstantinos Artopoiadis, Zehao Sun, Baopu Zhang, Gkreti-Maria Manesi, Ioannis Moutsios, Apostolos Avgeropoulos, Alfredo Alexander-Katz, Caroline A. Ross

Institutions: Shandong University, Massachusetts Institute of Technology, University of Ioannina

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: Shanghai Jiao Tong University, Division of Materials Research

Awards: G25141549, G4853230070

OpenAlex ID: W4416965132

FWCI: 0.212

Cites: 67

Cited by: 1

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