The role of HCl/LiF concentrations in the minimally intensive layer delamination (MILD) approach for synthesis of Ti3C2Tx MXenes
Year: 2025
Type: article
Abstract: Over the past decade, 2D carbides and nitrides (MXenes) have emerged as a promising material. Majorly, MXenes have been synthesized using the most traditional and highly concentrated approach known as hydrofluoric acid (HF) etching, however, found to be more hazardous. Owing to this, recent studies have focused on preparing safe, effective, and better-yielding MXenes. Parameters during synthesis play a critical role in preparing MXenes for better quality. The MILD approach has recently become an excellent alternative for HF acid etching. In this MILD method, hydrochloric acid (HCl) and lithium fluoride (LiF) were mixed at various concentrations to produce higher-quality MXenes. In this study, various concentrations of HCl and LiF were prepared for the selective removal of the Al layer from the Ti3AlC2 to synthesize the Ti3C2Tx MXenes. The study of prepared Ti3C2Tx MXene was conducted using various characterization instruments, including X-ray diffraction (XRD), Field-emission scanning electron microscopy (FE-SEM), Fourier-transform infrared spectroscopy (FTIR), Raman spectroscopy, and X-ray photoelectron spectroscopy (XPS). We observed that 6M of HCl and 0.6 g of LiF concentration (MX-01) shows better results. Additionally, the XRD patterns shows the distance of interlayers has been increased successfully. However, this investigation shows the various concentrations can be used for the Ti3C2Tx MXenes.
Source: Results in Engineering
Institution: Vellore Institute of Technology University
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: gold
Estimated APC paid: $1,940
Awards: G337271632, G3521765376
OpenAlex ID: W4417049820