Work

Investigation of nanofabrication on (111), (100) and (110) surfaces of single-crystal aluminium

Year: 2025
Type: article
Abstract: Nanofabrication using focused ion beam and reactive ion etching techniques was conducted on single-crystal aluminium substrates with three crystallographic orientations: (111), (100), and (110). Among these, the (110) surface exhibited the highest etch rate of 15±2 nm/min and the lowest surface roughness of 2±0.5 nm using reactive ion etching. This enhanced understanding of how crystal orientation affects surface quality is expected to contribute significantly to the advancement of low-loss diffractive optical elements across the infrared to extreme ultraviolet spectral ranges. This is the first time that etching on single-crystal aluminium has been investigated with focused ion beam and reactive ion etching, providing references for potential optical device fabrication.
Language: English
Open Access status: hybrid
Estimated APC paid: $2,500
OpenAlex ID: W4417073311
FWCI: 0.444
Cites: 10
Cited by: 1
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