Investigation of nanofabrication on (111), (100) and (110) surfaces of single-crystal aluminium
Year: 2025
Type: article
Abstract: Nanofabrication using focused ion beam and reactive ion etching techniques was conducted on single-crystal aluminium substrates with three crystallographic orientations: (111), (100), and (110). Among these, the (110) surface exhibited the highest etch rate of 15±2 nm/min and the lowest surface roughness of 2±0.5 nm using reactive ion etching. This enhanced understanding of how crystal orientation affects surface quality is expected to contribute significantly to the advancement of low-loss diffractive optical elements across the infrared to extreme ultraviolet spectral ranges. This is the first time that etching on single-crystal aluminium has been investigated with focused ion beam and reactive ion etching, providing references for potential optical device fabrication.
Source: Next research.
Institutions: Curtin University, University of Strathclyde
Language: English
Subfield: Computational Mechanics
Field: Engineering
Domain: Physical Sciences
Open Access status: hybrid
Estimated APC paid: $2,500
OpenAlex ID: W4417073311
