Work

Ar-O$_2$ plasma of resonant UHF discharge for chitosan's films processed

Year: 2025

Type: article

Abstract: This article explores the modification of chitosan films by treating Ar-O$_2$ with microwave plasma. The main idea is to use resonant plasma generation methods to treat chitosan films. Spectral and energy characteristics of microwave plasma are obtained. The mechanical properties, swelling, and solubility of chitosan films exposed to microwave plasma are studied. The dependence of film properties on the duration of treatment with resonant microwave plasma is demonstrated.

Source: Вестник Российского университета дружбы народов. Серия: Математика, информатика, физика

DOI: 10.22363//2658-4670-2025-33-4-461-470

Authors: Andrey V. Artemyev, Andrey S. Kritchenkov

Institution: Peoples' Friendship University of Russia

Language: English

Topic: Plasma Applications and Diagnostics

Subfield: Radiology, Nuclear Medicine and Imaging

Field: Medicine

Domain: Health Sciences

Open Access status: diamond

Funder: Ministry of Science and Higher Education of the Russian Federation

Award: G8940961743