Work

Why does CO2 plasma chamber seasoning favor nanocrystalline silicon growth?

Year: 2025

Type: article

Source: Applied Physics Letters

DOI: 10.1063/5.0282852

Authors: Lunnet Yokomizo Newman, Junkang Wang, Chandralina Patra, Pavel Bulkin, Karim Ouaras, Pere Roca i Cabarrocas, Erik V. Johnson

Institutions: Centre National de la Recherche Scientifique, École Polytechnique, Laboratoire de Physique des Interfaces et des Couches Minces, Institut Polytechnique de Paris, Institut Photovoltaïque d’Île-de-France

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Agence Nationale de la Recherche

Award: InnOvative Tandem Architectures

OpenAlex ID: W4417119307

FWCI: 0.911

Cites: 20

Cited by: 4

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