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Improving the Particle Removal Efficiency of Sn Contaminants on High-NA EUV Masks via Photo-Assisted Wet Cleaning

Year: 2025

Type: article

Source: ECS Journal of Solid State Science and Technology

DOI: 10.1149/2162-8777/ae2952

Authors: Woong Choi, Jehwan Park, Munkyung Kim, Jihyun Kim

Institution: Seoul National University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Ministry of Trade, Industry and Energy

Award: G2572957395

OpenAlex ID: W4417136884

FWCI:

Cites: 28

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Related to: 10