Work

2.45 GHz ECR coaxial plasma source : obtaining high density and uniform plasma

Year: 2016

Type: conference-paper

Abstract: Investigation on the performance of a 2.45 GHz ECR coaxial plasma source in order to obtain ahighly uniform and high density plasma was conducted in this study through Langmuir probediagnostic and optical emission spectroscopy. The source major difference with other worksresides in the use of two oppositely polarized permanent magnet mounted at the extremity of thecoaxial structure. High density (up to 4 times the critical density) and almost uniform plasmas(constant over 150 mm) were also achieved in the case where several sources associated togetherin a matrix configuration.

Source: HAL

Authors: Lo, Juslan, Latrasse, Louis, Guillot, Ph

Institutions: Institut National Universitaire Jean-François Champollion, Communauté d'universités et établissements de Toulouse, Diagnostic des Plasmas Hors Equilibre, Sairem (France)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W4417181088

FWCI:

Cites:

Cited by:

Related to: 10