High‐Concentration Perovskite Quantum Dots Photoresist Utilizing BMEP Monomer †
Year: 2025
Type: article
Source: Chinese Journal of Chemistry
DOI: 10.1002/cjoc.70381
Authors: Zhiming Qiu, Yanling Che, Jifei Ge, Pingping Zhang, Jianbing Shi, Gaoling Yang
Institution: Beijing Institute of Technology
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Awards: G522243060, G8861201339, G8951864686
OpenAlex ID: W4417292480