Work

Chemical vapor deposition growth of continuous monolayer antiferromagnetic CrOCl films

Year: 2025
Type: article
Abstract: The discovery of two-dimensional magnetic materials has provided an ideal platform for exploring physical phenomena in the two-dimensional limit. However, intrinsic two-dimensional antiferromagnetic materials have been rarely reported, limiting systematic studies of their electronic properties. The discovery of novel intrinsic two-dimensional antiferromagnets and the development of robust synthesis strategies, therefore, remain significant challenges. Here, we report the chemical vapor deposition synthesis of CrOCl monolayer films and nanosheets that exhibit excellent air stability. The CrOCl morphology is tunable, ranging from two-dimensional nanosheets to three-dimensional flower-like structures, with lateral sizes ranging from several microns to continuous monolayer films. Structural characterization confirms the material’s composition and high crystalline quality. Furthermore, magnetic measurements, supported by theoretical calculations, reveal a Néel temperature for CrOCl of ≈ 14 K. This work provides a reliable route for preparing two-dimensional antiferromagnetic materials. The development of novel two-dimensional antiferromagnets is crucial for enhancing the performance of spintronic devices. Here, authors realize the synthesis of CrOCl monolayer films and nanosheets that exhibit excellent performance.
Language: English
Open Access status: gold
Estimated APC paid: $6,990
OpenAlex ID: W4417423975
FWCI: 1.036
Cites: 49
Cited by: 5
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