Work

Room Temperature and Atmospheric Pressure Atomic Layer Deposition of SiO 2 Thin Films Mediated by a Molecular Water Layer

Year: 2025

Type: article

Source: Chemistry of Materials

DOI: 10.1021/acs.chemmater.5c02614

Authors: Hung-Anh Tran Vu, Dinh Nam Nguyen, Minh Nguyen Ngoc, Duy Cuong Nguyen, Ngoc Linh Nguyen, Anh-Tuan Pham, Viet Huong Nguyen

Institutions: Phenikaa University, Trường Đại học Khoa học và Công nghệ Hà Nội, Hanoi University of Science and Technology

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4417438492

FWCI: 0.68

Cites: 44

Cited by: 3

Related to: