Work

Preparation and field emission properties of Ti-CNx thin films co-deposited by pulsed cathodic arc and magnetron sputtering methods

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0004997

Authors: Zhubo Liu, Haowei Du, D. G. Piliptsou, A. S. Rudenkov, Bing Zhou

Institutions: Taiyuan University of Technology, Francisk Skorina Gomel State University

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, National Key Research and Development Program of China

Awards: G7380637590, G8697947614

OpenAlex ID: W4417468294

FWCI: 0.329

Cites: 39

Cited by: 1

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