Work

Novel Ru( ii )-photo-antibiotics for the development of infection-resistant mask coatings

Year: 2025

Type: article

Source: Chemical Communications

DOI: 10.1039/d5cc06235g

Authors: Arif Ali Mandal, Saurav Kumar, Srijan Singh, Apurba Mandal, Samya Banerjee, Prodyut Dhar

Institution: Indian Institute of Technology BHU

Language: English

Topic: Antimicrobial agents and applications

Subfield: Organic Chemistry

Field: Chemistry

Domain: Physical Sciences

SDG: Good health and well-being

Open Access status: closed

Funders: Rajiv Gandhi Centre for Biotechnology, Department of Biotechnology, Ministry of Science and Technology, India, Ministry of Textiles, Government of India, Science and Engineering Research Board

Awards: G1201825433, G1641617856, G3548909911, G4808635587, G8253996350

OpenAlex ID: W4417524912

FWCI: 0.581

Cites: 15

Cited by: 2

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