Work

Plasma Etching Fundamentals and Applications

Year: 1998

Type: book

DOI: 10.1093/oso/9780198562870.001.0001

Authors: M Sugawara, Barry L Stansficld, S Handa, K Fujita, S Watanabe, T Tsukamoto

Institutions: Tokyo Electron (Japan), Hachinohe Institute of Technology, Saga University, Institut National de la Recherche Scientifique

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2954551206

FWCI: 1.406

Cites:

Cited by: 181

Related to: 10