Work

Mathematical model for controlling nonuniformity in reactive ion etching

Year: 1994

Type: article

Source: Journal of Mathematical Sciences

DOI: 10.1007/bf02111958

Authors: G. A. Chechko, I. V. Medvedev, N. I. Khodakovskii, V. N. Sklepovoi

Institution: V.M. Glushkov Institute of Cybernetics

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W64671990

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Cites: 1

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Related to: 10