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Development of technology and design platforms at topological norms less than 90 nm

Year: 2024

Type: article

Abstract: \nThe article discusses Moore’s law, which has had a significant impact on the development of microelectronics, allowing us to evaluate parameters such as the performance of microprocessors and the clock frequency of digital circuits. However, the transition to technological standards of less than 100 nm has led to new problems in the production and design of chips. The article also discusses changes in integrated circuit design tools, ranging from manual creation of topological layers to modern automated systems capable of solving complex problems of logical modeling and analysis of chip parameters. The issues of the development of design technology at topological standards of 90nm are considered.\n

Source: Springer Link (Chiba Institute of Technology)

DOI: 10.1051/bioconf/202414503018/pdf

Authors: Ekaterina Grosheva, Anton Zarevich, Antonina Deniskina, Kaminat Fatullaeva

Institutions: Voronezh State University of Forestry and Technologies, Moscow Aviation Institute, Moscow State University of Civil Engineering

Language: English

Topic: VLSI and FPGA Design Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: green

OpenAlex ID: W6884516677

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