Work

An integrated exposure and measurement tool for 5-DOF direct laser writing

Year: 2024

Type: article

Abstract: \nAccurate and uniform fabrication of microstructures on highly curved substrates requires exposure with the waist of a focused laser beam at every point. In order to realize this, the exposure beam must be held perpendicular and focused onto the local substrate. Here we present an optical tool for our developed 5-axis nano-positioning and nano-measurement machine based on the chromatic differential confocal microscope.\n

Source: Springer Link (Chiba Institute of Technology)

DOI: 10.1051/epjconf/202430903005/pdf

Authors: Johannes Belkner, Johannes Leineweber, Georg Hein, Alexander Barth, Thomas Kissinger, Thomas Fröhlich, Eberhard Manske

Institution: Technische Universität Ilmenau

Language: English

Topic: Advanced Measurement and Metrology Techniques

Subfield: Mechanical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W6884535188

FWCI:

Cites:

Cited by:

Related to: