Year: 2025
Type: article
Abstract: In this paper, we discuss several enhancement approaches to increase the resolution and sensitivity of optical microscopy as a tool for dimensional nanometrology. Firstly, we discuss a newly developed through-focus microscopy technique providing additional phase information from the afocal images to increase the nanoscale sensitivity of classical microscopy. We also explore different routes to label-free or semiconductor compatible labelling super-resolution microscopy suitable for a broad range of technical applications. We present initial results from, a new wide-field super-resolution imaging technique enabled by Raman scattering. In addition, we discuss super-resolution imaging using NV centres in nano-diamonds as labels and their application in future reference standards.
Authors: Mohammad Nouri, Paolo Olivero, Stefanie Kroker, Tim Käseberg, Ivano Ruo-Berchera, Bernd Bodermann, Himanshu Tyagi, Deb Roy, Deshabrato Mukherjee, Thomas Siefke, Poul Erik Hansen, Astrid Tranum Rømer, Miroslav Valtr, Pietro Aprà, Peter Petrik
Institutions: Physikalisch-Technische Bundesanstalt, Technische Universität Braunschweig, University of Turin, Istituto Nazionale di Ricerca Metrologica, Swansea University, Institute for Technical Physics and Materials Science, Friedrich Schiller University Jena, Danish National Metrology Institute, Český metrologický institut, Istituto Nazionale di Fisica Nucleare, Istituto Nazionale di Fisica Nucleare, Sezione di Torino
Language: English
Subfield: Computer Vision and Pattern Recognition
Field: Computer Science
Domain: Physical Sciences
Open Access status: green
Awards: G434337789, G5166550447
OpenAlex ID: W6884549950
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