Supplementary document for Rapid quench annealing of Er implanted Si for quantum networking applications - 7249984.pdf
Year: 2024
Type: supplementary-materials
Abstract: Supplement 1
Source: Figshare
Authors: Hughes, Mark, Liu, Huan, Brookfield, Adam, Wang, Tianrui, Crowe, Iain, Dan, Yaping
Language: English
Subfield: Atomic and Molecular Physics, and Optics
Field: Physics and Astronomy
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W6902298914
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