Additional file 1 of Selective metal passivation by vapor-dosed phosphonic acid inhibitors for area-selective atomic layer deposition of SiO2 thin films
Year: 2025
Type: article
Abstract: Supplementary material 1.
Source: Figshare
Authors: Lee, Jeong-Min, Lee, Seo-Hyun, Lee, Ji Hun, Kwak, Junghun, Lee, Jinhee, Kim, Woo-Hee
Institution: Hanyang University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W6902299263
FWCI:
Cites:
Cited by:
Related to: