Additional file 1 of Effect of La and Si additives in Zr-doped HfO2 capacitors for pseudo-linear high-κ dielectric applications
Year: 2025
Type: article
Abstract: Additional file 1.
Source: Figshare
Authors: Lee, Minjong, Jung, Yong Chan, Kim, Jin-Hyun, Narayan, Dushyant M., Kang, Sehun, Park, Woo Young, Im, Kivin, Kim, Jiyoung
Institutions: The University of Texas at Dallas, SK Group (South Korea)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W6902409953
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