Work

Effects of the Interlayer Interactions in Frustrated Magnetoelectric Thin Films

Year: 2024

Type: article

Source: The Physics of Metals and Metallography

DOI: 10.1134/s0031918x2460249x

Authors: I. F. Sharafullin, D. I. Abdrakhmanov, A. I. Samigullina, A. R. Latypova

Institution: Ufa University of Science and Technology

Language: English

Topic: Multiferroics and related materials

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W6903494876

FWCI: 0.077

Cites: 26

Cited by: 1

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