Work

Quantitative Analysis of Oxygen-Related Radical Effects on Aramid Surface Modification via Vacuum Ultraviolet Photolysis Method

Year: 2024

Type: conference-paper

Source: IEEE Conference on Electrical Insulation and Dielectric Phenomena (CEIDP)

DOI: 10.1109/ceidp61745.2024.10907690

Authors: Hao-ou Ruan, Hao Du, Takahiro Umemoto, Ryo Ono, Akiko Kumada, Masahiro Sato

Institution: The University of Tokyo

Language: English

Topic: Plasma Applications and Diagnostics

Subfield: Radiology, Nuclear Medicine and Imaging

Field: Medicine

Domain: Health Sciences

Open Access status: closed

OpenAlex ID: W6922326421

FWCI: 1.536

Cites: 17

Cited by: 1

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