Work

Nanoscale InSe/GaTe van der Waals Heterojunction Diodes for Extreme Deep Ultraviolet Detection in Semiconductor Lithography and Inspection

Year: 2025
Type: article
Language: English
Open Access status: closed
OpenAlex ID: W6940501176
FWCI: 0.417
Cites: 68
Cited by: 2
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