Work

Full 3D surface photolithography exposure system with direct laser writing and / or digital micro-mirror matrix stepping

Year: 2024

Type: article

Abstract: Existing technology for photolithography exposure can use direct laser writing or (digital) micro-mirror matrix stepping UV light sources. We suggest a new system architecture and use these existing UV light sources and combine them with multiple axis motion system as known from CNC machine tools. This combination allows photolithography exposure to create structures in photoresist on any positive shaped 3D surface topology.

Source: Zenodo (CERN European Organization for Nuclear Research)

DOI: 10.5281/zenodo.13752984

Author: Spoerl, Christian

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W6949234570

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