Supplementary document for Mask 3D parameter optimization for improving imaging contrast of plasmonic lithography - 6987778.pdf
Year: 2024
Type: supplementary-materials
Abstract: 518309
Source: Figshare
Authors: He, Jianfang, Ding, Huwen, Wei, Yayi, Ye, Tian-Chun
Language: English
Subfield: Biomedical Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W6958638372
Cites:
Cited by:
Related to: