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Evaluating Plasma Etching for Graphene Fabrication: Etch Rate Control and Flake Characterization

Year: 2025

Type: conference-paper

Source: DigitalCommons@Linfield (Linfield College)

Authors: Williams, Makai T, Crosser, Michael S.

Language: English

Topic: Graphene research and applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7047123447

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