A High-Density 3-D Capacitor Using Through Glass Via Structure
Year: 2025
Type: article
Source: IEEE Electron Device Letters
Authors: Su-Geun Kim, Sung-Chai Yoo, Jeongwon Oh, Byung-Wook Min, Jong-Min Yook
Institutions: Korea Electronics Technology Institute, Yonsei University
Language: English
Topic: 3D IC and TSV technologies
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W7076053372
