Work

Benchmarking analytical electron ptychography methods for the low-dose imaging of beam-sensitive materials

Year: 2025

Type: article

Source: Springer Link (Chiba Institute of Technology)

Authors: Hoelen L. Lalandec Robert, Max Leo Leidl, Knut Müller-Caspary, Jo Verbeeck

Language: English

Topic: Advanced Electron Microscopy Techniques and Applications

Subfield: Structural Biology

Field: Biochemistry, Genetics and Molecular Biology

Domain: Life Sciences

Open Access status: closed

OpenAlex ID: W7077504461

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