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A Novel AND-Type FinFET Contact RRAM in Pure 7 nm FinFET CMOS Logic Process

Year: 2025

Type: article

Source: IEEE Electron Device Letters

DOI: 10.1109/led.2025.3614177

Authors: Pin-Jie Zeng, Wei-Hwa Lin, Yen-Yu Liu, Yue-Der Chih, Yih Wang, Jonathan Chang, Ya-Chin King, Chrong Jung Lin

Institutions: National Tsing Hua University, Taiwan Semiconductor Manufacturing Company (Taiwan)

Language: English

Topic: Advanced Memory and Neural Computing

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Science and Technology Council

OpenAlex ID: W7083324949

FWCI:

Cites: 17

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