Metal oxide semiconductor-based negative capacitance field-effect transistors with a sub-threshold swing of below 30 mV/dec
Year: 2025
Type: article
Abstract: Effective data processing and low power consumption of electronic devices have been demanded for artificial intelligence technologies. Here, we report IGZO-based negative capacitance field-effect transistors (IGZO NC-FETs) with stacked gate dielectrics composed of ferroelectric Hf 0.5 Zr 0.5 O 2 and high- k Al 2 O 3. The manifestation of negative capacitance behavior was confirmed by the suppression of the thermionic subthreshold swing limit resulted in the improvement of low-power switching performance. The IGZO NC-FET occurs below 30 mV/dec of a steep subthreshold swing (SS), exceptionally across a gate bias range of ±1 V. Furthermore, high- k Al 2 O 3 as a stabilizing layer suppresses the hysteresis, effectively coupled with a conventional ferroelectric layer.
Source: Materials Today Electronics
Authors: Ji Hyeon Min, Seong Cheol Jang, Kyong Jae Kim, You Seung Rim, Hyun-Suk Kim
Institutions: Dongguk University, Sejong University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: gold
Estimated APC paid: $2,860
OpenAlex ID: W7083583187
