Work

Thermal Stabilization of Self-Assembled Monolayers by ALD-Grown Metal Oxide Overlayers

Year: 2025

Type: article

Source: ACS Applied Engineering Materials

DOI: 10.1021/acsaenm.5c00343

Authors: Sae Mitamura, Sho Nekita, Takeshi Ono, Takuro Hosomi, Jiangyang Liu, Wataru Tanaka, Tsunaki Takahashi, Tetsuya Okuyama, Satoshi Hata, Takeshi Yanagida

Institutions: The University of Tokyo, Kyushu University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Education, Culture, Sports, Science and Technology, Japan Society for the Promotion of Science, Core Research for Evolutional Science and Technology, Precursory Research for Embryonic Science and Technology

Awards: G1475449802, G2031208398, G3007769976, G3737490692, Control of food ripening stage using real-time sensing of volatile organic compounds, G456432355, G5335173209, G6271895590, G6581832675, Microwaves x structure-controlled catalysts for utilizing carbon resource conversion, G8406043338

OpenAlex ID: W7083590983

FWCI: 0.68

Cites: 44

Cited by: 3

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