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Selective area regrowth of silane-doped GaN achieving record carrier density for ultra-low resistive Ohmic contacts for AlGaN/GaN HEMT

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Year: 2025
Type: article
Source: Applied Physics Letters
DOI: 10.1063/5.0289411
Authors: Swarnav Mukhopadhyay, Surjava Sanyal, Ruixin Bai, Brahmani Challa, Chirag Gupta, Shubhra S. Pasayat
Institution: University of Wisconsin–Madison
Language: English

Topic: GaN-based semiconductor devices and materials
Subfield: Condensed Matter Physics
Field: Physics and Astronomy
Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, U.S. Department of Defense, Air Force Research Laboratory, Office of Naval Research Global
Awards: G4080680089, (DEPSCOR-RC FY23) AN EXPERIMENTALLY VALIDATED PREDICTIVE SIMULATION FRAMEWORK FOR III-NITRIDE HEMTS AT > 94 GHZ OPERATION, CAREER: Towards highly efficient UV emitters with lattice engineered substrates, G870122518
OpenAlex ID: W7084046162
FWCI: 0.628
Cites: 40
Cited by: 2
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