Work

Amorphous Oxide Semiconductor Materials and Devices for Monolithic and Heterogeneous Integration

Year: 2025

Type: dissertation

Source: RIT Scholar Works (Rochester Institute of Technology)

Author: Powell, Eli P

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7084229312

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