Work

Contacted-Poly-Pitch (CPP) Scaling Limitations of Si Gate-All-Around Nanosheet (GAA-NS) Devices

Year: 2025

Type: article

Source: IEEE Transactions on Electron Devices

DOI: 10.1109/ted.2025.3615917

Authors: Krishna K. Bhuwalka, Lee-Chi Hung, Gerhard Rzepa, Franz Schanovsky, Zlatan Stanojevic, Lei Hou, Wei Li, Markus Karner, Zheng Yu

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7085138667

FWCI: 0.453

Cites: 18

Cited by: 2

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