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On the Influence of Various Oxygen-Containing Gases on the Composition of Trifluoromethane Plasma

Year: 2025

Type: article

Source: Russian Microelectronics

DOI: 10.1134/s1063739725600633

Authors: A. M. Efremov, E. E. Koryakova, V. B. Betelin, K.-H. Kwon

Institutions: Kurchatov Institute, Research Institute of Molecular Electronics, Korea University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7106794189

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Cites: 17

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