Work

Effects of Bias Power on EEPFs near the Substrate in Argon ICP Measured by a Langmuir Probe

Year: 2025

Type: conference-paper

Source: Tokyo Tech Research Repository (Tokyo Institute of Technology)

Authors: 叶宇晨, Yuchen Ye, 土居謙太, Kenta Doi, 清田哲司, Tetsuji Kiyota, 島谷和希, Kazuki Shimatani, 羽生陽向, Hinata Hanyu, 櫻井彩貴, Ayaki Sakurai, 山下雄也, Yuya Yamashita, 根津篤, Atsushi Nezu, 赤塚洋, Hiroshi Akatsuka

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7111992178

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