Elementary Chemical Reactions on the SiO2 Surface in Fluorocarbon Plasma
Year: 2025
Type: article
Source: Plasma Physics Reports
Authors: I. I. Ziganshin, D. V. Lopaev, A. T. Rakhimov
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W7116629451
