Work

Dual Pathways in 222 nm Far-UVC Photodegradation of Sulfonamides: Direct Photolysis and Radical-Mediated Self-Sensitized Oxidation

Year: 2025

Type: article

Source: Environmental Science & Technology

DOI: 10.1021/acs.est.5c13885

Authors: Haoxin Li, Huiying Jia, Runze Fan, Wenjun Sun, Yanan Feng, Zifu Li, Xiuwei Ao

Institutions: University of Science and Technology Beijing, Tsinghua University

Language: English

Topic: Advanced oxidation water treatment

Subfield: Water Science and Technology

Field: Environmental Science

Domain: Physical Sciences

SDG: Clean water and sanitation

Open Access status: closed

Funder: National Natural Science Foundation of China

Award: G8811522617

OpenAlex ID: W7117384129

FWCI: 1.531

Cites: 66

Cited by: 6

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