Work

Enhancement of chamber dry-cleaning performance with nitrous oxide additive to carbonyl fluoride

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0005002

Authors: Hyuck Byun, Chae Woon Kim, Se Yun Jo, Sang Jeen Hong

Institution: Myongji University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDGs: Responsible consumption and production, Climate action

Open Access status: closed

Funder: Korea Evaluation Institute of Industrial Technology

Award: G825666849

OpenAlex ID: W7117567167

FWCI: 0.462

Cites: 32

Cited by: 2

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