Retraction of “N 2 /H 2 Plasma-Enhanced Atomic Layer Deposition for SiO 2 Gap Filling: Implications for Nanoelectronics in Semiconductor Manufacturing”
Year: 2025
Type: retraction
Abstract: [This retracts the article DOI: 10.1021/acsanm.4c06844.].
Source: ACS Applied Nano Materials
Authors: Sameh Okasha, Donald Munson, Jun Yoshikawa
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: hybrid
Estimated APC paid: $4,500
OpenAlex ID: W7117688582
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